Hello everyone,
I'm trying to fabricate perovskite solar cells, but have not been able to get very successful results especially in terms of FF. The structure of the device is like FTO/c-TiO2(sputtering)/mp-TiO2/Perovskite/HTM(Spiro-OMeTAD)/Au(sputtering). My concern is about sputtering of Gold on HTM layer. Do you guys have any experience with sputtering gold on organic materials. Does plasma damage the organic layer i.e Spiro-OMeTAD?
Thank you very much in advance for your help.
I think that the conducting films on the top and bottom surfaces need to have a resistivity less than 10 ohm/square for good results. Can this be achieved by you techniques? The transparent top film is going to be harder to do!
Dear Hojjat,
Would you please display your dark and illuminated I-V curves for representative samples. Did you tempered the deposited film to affect good low ohmic contact between the metal and the Spiro-OMeTAD. This heat treatment is mandatory after sputtering. It may be performed under N2 atmosphere for for tome of 10s of minutes at about 100 degree centigrade.
wish you success
Plasma will damage HTM (spiro). And a working cell can realized with sputtering Au in HTM free architecture. This can be the starting point.
Finally, after about seven months, our thermal evaporator got repaired and I could do an experiment last week. The results are not interesting, (PCE 10-13%), but at least they are not short-circuited. Everything for these cells are the same as before, however, I used the thermal evaporator instead of E-beam evaporator. There are a few papers that reported high efficiency PSCs using e-beam evaporation for deposition of Gold (Like a group at Toronto, PCE>20%), but in our case, most of our devices got short-circuited.
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