The PEDOT-PSS layer on silicon can be removed by the following methods:
-You can remove them mechanical by cutting blades. After that you polish the silicon surface using polishing etch.
-You can use oxygen plasma etching, for more information please go to the site: https://www.researchgate.net/.../257439959_Micropatterning_PEDOTPSS
- you can use laser to ablate the layer: for more details please see the link:http://download.springer.com/static/pdf/1/art%253A10.1007%252Fs00339-012-7172-3.pdf?originUrl=http%3A%2F%2Flink.springer.com%2Farticle%2F10.1007%2Fs00339-012-7172-3&token2=exp=1457552027~acl=%2Fstatic%2Fpdf%2F1%2Fart%25253A10.1007%25252Fs00339-012-7172-3.pdf%3ForiginUrl%3Dhttp%253A%252F%252Flink.springer.com%252Farticle%252F10.1007%252Fs00339-012-7172-3*~hmac=6fbcab0cfce28d688319664881397b028e99f67e23f3d2096b31caec738d32b7
You can use etching chemicals by exposing the PEDOT layer to strong
oxidizing agents. The following oxidizers have been tested:
· NaOCl (bleach)
· K2Cr2O7 (dichromate) + HNO3
· KMnO4 (permanganate) + H2S04
Depending on concentration, exposure time and oxidizing
agent, the PEDOT layer will be passivated or completely
etched away.For more details please follow the link:http://www.agfa.com/docs/sp/sfc/Patterning_UV-lithografie.pdf