Immerse your SOI chip with nanowires in fresh, high-purity acetone for about 2–3 minutes (no sonication), then transfer it directly to a clean IPA bath for another 2–3 minutes to rinse away residues. Dry the chip carefully using a nitrogen gun at a shallow angle with low pressure to avoid damaging the nanostructures. If needed, finish with a mild bake at 80–90°C for 1–2 minutes to evaporate any remaining solvent. Use clean glassware and fresh solvents to avoid contamination.