I will be etching a silicon dioxide wafer with either CF4 or SF6 in a stainless steel chamber. I have 2 questions:
If I wanted to electrically insulate the chamber what would be a good material to use? The ones I’ve found so far are Alumina or diamond, but the problem with alumina is that it reacts with fluorine and causes deposition on the walls and diamond is not very electrically insulating. Does anyone have recommendations on good materials that could work?
Additionally. if I decide not to insulate the chamber, would there be any issue with etching SiO2 with CF4 or SF6 in a stainless steel chamber?
I am still learning about this topic so if you have any good articles on this topic I would appreciate that as well. Thanks!
Hi,
why would you like to etch in an insulating chamber?
What kind of etching device do you use? I am guessing ICP?
A stainless steel chamber wont be a problem if you etch with those gases.
For normal Silicon I would suggest SF6 in combination with oxygen and some C4F8.
Do you just have a SiO2 layer on top or is your whole device SiO2?
How do you clamp your wafer?
What is your goal of etching?
all the best
Nina
Hi,
Thanks for answering my questions. We will be using ICP. The only reason we were considering insulating is because we are purchasing a used chamber and we don't know what sorts of chemicals it could be covered in, so we were considering coating it, but it's not necessary. Really this whole project is about researching and learning more about how etching works.
Thanks
- Badges
- Science topic
- Similar topics
- Engineering
- Materials Engineering
- Coating