I have followed this given sequence and i got p-type MS-plot.
1. OCP---3600s
2. reduced oxide layer potentiostatically..-1.2V for 10min
3. potentiostatic scan for film growth.. 0.6V... for 8 hours
4. EIS
5. Mott-Schottky ..0.6--1V, step size 0.02, I000Hz
now, all EIS results i found as per literature, while MS in this continuation would showed p-type behaviour and during test observation, i also noticed micro-amp ranges with RED blinking in Gamry..
whereas, when i follow.. potentiostatic scan for film growth 0.7V just for 3600 second and perform MS directly, i got n-type... please guide why its happen.. solution is chloride based... pH around 6.5 to 7.
Thanks
I think there is good recommendation in published literatures to apply a frequency greater than 1 kHz with relatively higher scan rate to perform Mott Schottky analysis. In this case the ionic conductivity is negligible and the response is only due to electronic conductivity.
Please go through pp-22 of the attached article.
Best regards
Dear Muhammad Siddiqui,
I would suspect that your n-type behavior might be related to the nature of the oxide that you grow on your Ti alloy surface. Depending on the stoichiometry of your oxide it can be either p- or n-type. E.g. TiO2 is a native n-type semiconductor due to oxygen vacancies.
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