I have metal nanoparticles on sapphire substrate. Some carbon/hydrocarbon has deposited of the nanoparticles surface due to long exposure in SEM. How can I selectively remove C layer from metal nanoparticles without affecting them. The C layer is ~ 30 nm thick
I tried dissolving it in acetone, but I cant use ultra-sonication along with it. Acetone did not help much.
Plasma cleaner for short time does not remove C layer. Long time plasma cleaning (using oxygen mix) result in particle oxidation.
Dear Anuj Bisht, what is the exact structure of these carbon based compounds. You can try solvents with similar C number. Also ethanol is more prefered than acetone for cleaning. My Regards
Contamination build up in SEM can effectively be removed by plasma cleaning. Plasma cleaners are often mounted on modern SEMs or used in TEM sample preparation.
Anuj Bisht
You ask 'How can I selectively remove C layer from metal nanoparticles without affecting them?'. In my view. any treatment is likely to alter the material and it's a risk you must take. In my view, oxygen plasma etching will be the best and most controllable route.
Dear Dr Anuj Bisht . See the following useful link: https://www.osti.gov/biblio/1331164
Thank you everyone for the suggestions.
The electron beam exposure was for long duration during Picoindentation. I think the C is polymerized. Finding type of C is out of my domain.
Acetone and ethanol with ultrasonication for few houes did not help much for removing the polymerized C.
Ag nanoparticles were oxidized in oxygen based plasma cleaner.
As I wanted to just find height of particle, I finally resorted to FIB TEM lamella preparation.
Regards,
Anuj
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