Hello,
I'm working on Transport measurement of some material on Si/SiO2 substrate.
I used the photolithography for making align marker and photopad.
To avoid Batman wing(doggy ears), i used LOR 2a and GXR 601 for negative profile and mr-REM 700 remover for lift off
After using LOR2a, i found the weird residue.
So, I cleaned our substrate (already made substrate) again.
but it still remain...
what's wrong ? and how can i remove the residue ?
and if you know how to use the LOR, please tell me.
Thank you
@Chaobin Yang
I didn't try that because i want to solve the this problem without etching ( but if it is necessary for removing residue, I will add it.
Um..i think I made a big mistake like lift off procedure, solution temperature or N2 drying ... etc
I think if i add O2 plasma step it will be removed as you mentioned. !
thank you !
Hi Sungjin,
Can you share the image after coating the substrate with LOR?
O2 plasma should definitely help you but I doubt if it would solve the issue from repeating?
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