I have an ITO (In:Sn = 90:10) target and prepared a 150nm thin film on a glass substrate through RF sputtering under conditons Ar : O2 = 20: 2 sccm with 100W power. I tried to measure the resistance of a commercially available ITO glass substrate with simple multimeter which is around 20-30 ohm. Whereas the resistivity of home made ITO coated glass is very high behaving like an insulator. Can someone help me how can I decrease the resistivity and prepare a conducting thin film on a glass substrate?