How to measure the sheet resistance of a titanium silicide film of less than 10 nanometers with only one photomask, or what measurement methods are available?
Four-probe method (also known as the Kelvin technique) is suitable if the film is metallic or semiconducting sample. If the film is insulating one, then two-probe using electrometer will be a suitable method.
But what should I do if the film is too thin and I'm afraid it'll poke through?
Hi, use thin metal wire to connect film and instrument. Still, it may affect the film. So, characterize film using non-destructive technique like XRD, Raman, SEM, etc. Finally, measure sheet resistance of the film.
Four -Point Probe or micro 4-point probe (probing on blanket wafer) can be used. Transfer Length method is also recommendable.
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