What are the factors affecting the peak intensity for a sputter deposited epitaxial thin film and how to control these in order to get a highly crystalline film ?
Kshyanaprava Pradhan You can expect a higher XRD peak intensity when the X-ray interaction area is higher or simply, the thickness of the deposited film is higher. Coming to sputter deposition: to obtain an epitaxial film, you would need to optimize the RF power (incase you are using an insulating target), working pressure, substrate-to-target distance, etc..
Using a single crystal substrate would give you a better chance at producing an epitaxial film.
Kshyanaprava Pradhan you can try to do your XRD at a shallower angle, this is commonly called GIXRD this can also help you remove peaks from your substrate. In addition to using a shallower angle you can also increase the scan time!
Good luck!
https://en.wikipedia.org/wiki/Grazing_incidence_diffraction
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