19 May 2017 3 5K Report

 I want to etching or patterning for bilayer channel layer of transistor consist of SnO2/ZnO on ZrO2 dielectric layer

 Generally, I thought that above process would proceed by HCl etchant

 But I think that using HCl etchant remove both SnO2/ZnO and ZrO2 

Do you know how to etch metal-oxide channel layer without metal-oxide dielectric layer?

Sorry to say, lift-off process wasn't helpful since I mainly proceeded by sol-gel process

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