I am having a thin film of Cr Au of 30nm (total) on Fused Silica deposited by sputtering. I wasn't able to obtain any Kikuchi pattern. My surface roughness is around 2.5nm. I could not find any surface preparation techniques for thin films.
Let me know how to do EBSD.
Does your film exhibit features of crystallinity in other methods like XRD? If it's cold-sputterdeposited metal without any medium-range order, there will not be a diffraction condition to be fulfilled and EBSD will of course only show a giant blur.
If you insist in using conventional EBSD, then you have to lower the voltage and optimize the working distance. You can alternatively use t-EBSD, there you will have to increase the the acceleration voltage and lower the working distance. I added some sources to help explaining this
Here's the effect on lowering the voltage and decreasing the interaction volume, Article Towards ultrahigh resolution EBSD by low accelerating voltage
This conference poster for t-EBSD can help
Article Specimen-thickness effects on transmission Kikuchi patterns ...
https://www.nist.gov/system/files/documents/pml/div683/conference/TU-03-2.pdf, @Katherine P. Rice
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