How metal property changes by using different deposition method, such as E-beam evaporation, thermal evaporation and sputtering? Especially how the electrical property and optical property it is when use those methods to prepare metal film at several nm? Is there any publication?
All of the methods you mentioned will affect the microstructure of the films deposited. In particular, if you use high-energetic conditions for film growth, as plasma-assisted methods like sputtering, coatings will be characterized by high defect densities, which will may deteriorate the optical properties and the electrical conductivity. In case of depositing metals with low melting temperatures, e.g. Cu, these defects will anneal out at room temperature (self-annealing). In case of refractory metals, e.g. Mo or W, these defects will remain.
Hi Chenjin as Christian says it is primarily a case of the energy conditions at the time of making the film that changes the structure, however sputtering is not as bad as he suggests! The energetics can be changed considerably depending on how much plasma is "seen" at the substrate, and in the case where, for example the substrate is close to the target (and with an "unbalanced" mangetron) The film can be deposited in such a way that there is a very high degree of crystallization. As a quick example, see:
https://pdfs.semanticscholar.org/2ecc/f8660faaa3a90d04013d001324e06ea470ef.pdf
Thermal evaporation is perhaps the lowest energy deposition method, but the films can be improved by bathing the substrate in a plasma to assist.
The deposition method and deposition conditions affect the physical properties of the metal film. The main effect is because of the different microscopic structure of the metal. However, the effects on the metal is much less than the effects on semiconductors. The electron concentration in the metal is hardly changed by the micro structure. May be the mobility is more sensitive to the microscopic structure. Since the optical properties depend on the electrical performance such as conductivity and dielectric constant, the optical properties will not change appreciably with the deposition method. However, to overcome the defects at the deposition one makes postdepostion annealing at relatively high temperature to enhance the deposited metal layer.
Best wishes
Just look up the Thornton structure zone model.This should be a good start point:
Article Revised Structure Zone Model for Thin Film Physical Structure
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