I want to dissolve bathcuproine in methanol and to prepare thin film on substrate.Is annealing necessary for this? and after dissolving how long time i will wait for the solution?what will be the rate (rpm) of spin-coater.thanks in advance..
The factors that control the final film thickness are:
- Concentration of precursor in solvent
- Viscosity of solution
- Spin speed (and appropriate spin time)
- Effect of post-spin processes - e.g. baking and film shrinkage
You'll have to work empirically to understand what works in your final application of the produced material. And what might that end application be? You do not tell us...
The important production conditions are:
- Cleanliness of the substrate - appropriate cleaning regimes with filtered warm surfactant solutions (e.g. 5% Decon 90; sonication; 50 C followed by 18 MOhm DI water rinse)
- Cleanliness of the solutions - filtered to 0.02 microns or better
- Wetting of the solution on the substrate: function of contact angle; may need a surfactant or solvent change
- IMHO, if you're not working under Class 100 conditions, you'll be in for a hard time
BTW, there is no such thing as (and how i can set the) 'thickness of solution?'
Dr. Alan F Rawle has elaborated it in quite detail and I agree to him.
I think, the question is how to adjust the thickness of the film. It depends on a number of things: (a) density or/and viscosity of precursor solution, (b) rpm, (c) total time (acceleration + steady-speed + deceleration), (d) temperature of processing, (e) post-synthetic treatment, (f) hydrophilic or -phobic nature of substrate and thereby the contact-angle of the fluid on substrate. The thickness decreases more if (b) and (c) increase and (a) decreases. Effect of the rest is different in different cases.
In brief, there is no universal calibration for it. Obviously, keeping the above things in mind, one has to optimize the samples by trial and error.
For starting values, I'd recommend in your case, start with the values 500 rpm, total 1 min time (10 s accn. + 45 s fixed speed + 5 s decn). After preparation, you may heat up the films at 80 deg C for 10 min. You can start with glass, FTO/ITO-like substrates, depending on your plan of work. Obviously, all these values need lots of trail and error for optimization.
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