How does the argon flow rate affect the crystalline quality of TiO2 anatase thin film deposited at constant temperature (350 °) in the sputtering method (other deposition parameters are also constant, varying only the flow rate of Ar )?
Dear Serrar, thank you for sharing this very interesting technical question with the RG community. In this context please have a look at the following potentially useful articles which might help you in you analysis:
Influence of Argon Flow Rate on TiO2 Photocatalyst Film Deposited by dc Reactive Magnetron Sputtering
Article Influence of Argon Flow Rate on TiO2 Photocatalyst Film Depo...
Influence of argon flow rate on structural and optical properties of TiO2 thin films deposited by RF sputtering Conference Paper Influence of argon flow rate on structural and optical prope...
and
A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique
Article A Review on the Pathways of the Improved Structural Characte...
The last two articles are freely available as public full texts on RG. The full text of the first paper can certainly be easily requested directly from one of the authors via RG.
Good luck with your research and best wishes!
Thank you very much for your help, support, and valuable guidance that I will apply Professor Frank T. Edelmann
Dear Kien,
please allow me the friendly remark that is often quite useful to read previous answers given to a technical question. Both papers which you suggested are certainly useful, but both of them have already been cited in my answer. With best wishes, Frank Edelmann
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