I need to deposit lanthanum manganites and cobalt ferrites, but I am not sure how I can avoid damage to the magnetron when using magnetic targets.
What kind of damage have you experienced with your magnetron while using magnetic targets.
I have not experienced any damage to the magnetron using magnetic targets.
Normally with magnetron electrodes, when magnetic targets are used, it is difficult to achieve sputtering action. One should therefore use very thin targets. For example I used Nickel foils (0.2 mm thick to deposit Ni thin films.
There is no damage risk for the magnetron. The difficulty in sputtering from a magnetic target is the magnetron field lines close through the target itself, therefore, the plasma will be very difficult to maintain. If the target is thin enough (usually, 1 mm or less), and the magnetron magnets also strong enough, it is possible to deposit high quality magnetic films, including permanent magnets and soft magnets. This is our experience.
Dear Sir,
please find an example of the use of magnetron with a ferrimagnetic spinel oxide target at:
https://hal.archives-ouvertes.fr/hal-01168678
(Preparation of iron cobaltite thin films by RF magnetron sputtering)
Best regards.
Ph. Tailhades.
Dear Susan,
There should be no problem when depositing a magnetic element. What they have to find is the right power for the conditions of their target. For this I recommend that you analyze the maximum operating power according to the thickness of the target and the material. Then they can vary a range less than 10% of that power to find the appropriate parameters. A more detailed idea of the operation of the magnetron can be seen in the book THIN FILM MATERIALS TECHNOLOGY Sputtering of Compound Materials by Kiyotaka Wasa,
Makoto Kitabatake, and Hideaki Adachi.
I also recommend that you look at other articles where they manufacture with your material to give you an idea of the powers they use.
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