I am planning to get a smooth layer PVA with 300 - 400nm in thickness on Si substrate by spin coating, but I do not know which solvent is good in this case. Do any one have experience on PVA spin coating help me? Thansk a lot!
Water is the best solvent. Maybe you have figure out the viscosity a little bit, and try to deposit the film by spin casting onto the wafers. It will dry up quickly, and you mhave to take care about the wetttability of the substrate, and aim for a univofm coating, with no pinholes.
Thanks a lot, everyone! I used DI water for the solvent of PVA solution. After preparing a 5% solution for spin coating, I obtained the thickness of PVA around 200 nm at 3000 rpm in 60 seconds.
Pham Xuan Thi you mentioned that for "5% solution of PVA in DI by spin coating, you got PVA thickness around 200 nm at 3000 rpm in 60 seconds " .
how do you avoid any pinholes or non-uniform surface. I want to deposit PVA thin film on glass substrate. what kind of surface treatment or cleaning should I do to get a good uniform film.
also did you use some oven heating or just let the film dry in room temperature.