I want to use AFM to compare the surface roughness of Cu under different pretreatment process. But the Cu surface is waviness, whcich domainates the AFM results. Does anyone know how to obtain the results of the picture below?(Picture comes from "Effects of annealing on copper substrate surface morphology and graphene growth by chemical vapor deposition")
Thanks a lot.
Thanks,Kranthi. Could you please explain CMP to me? I don't know what CMP stands for.
the film taht you synthesize exhibits a roughness
it depends on several parameters during the growth process
it has no relation with afm analysis
I agree with you. But the copper surface roughness consists of two parts: the long-range waviness and the short-range roughness. The roughness I mean is the short-range part, which is the attached picture means.
So the main problem for me is how to exclude the waviness part of copper.
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