I have grown Ti thin films using DC magnetron sputtering on a glass substrate. Now, I want to know the selection rule of annealing temperature to choose the best annealing temperature to observe the temperature dependent optical properties of the grown films.
To choose the best annealing temperature, you should know needed particle size and morphology for your application.
Sir, is there any quantitative analysis or theoretical model to choose the appropriate annealing temperature?
The best way to find the annealing temperature is to choose the different temperature. During these temperature changes, you need to check the phase of Ti. Annealing also depends on your Ti phase (alpha, beta or alpha+beta) requirement. As Mohamed Elsayed Harb said the particle size also matter but in your case, its depend on grain size. At high-temperature, Ti becomes a Ti oxide. By taking all this into the account you just choose the different temperature and optimize it.
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