Through thermal evaporation, I deposited a layer of Ag on silicon oxide / silicon substrate, but a malfunction of the machine meant that a much larger layer was deposited than necessary. I need to recover the substrate. Is there a way?
Good day, Valentina Cantaro! Hope you are doing well.
Maybe you should try Piranha solution? Or H2O2:NH4OH treatment? It is kind of SOP for photovoltaics. I do not remember the details, I will try to share with you later.
Yours sincerely,
M. Sc. Vadym Chibrikov
Department of Microstructure and Mechanics of Biomaterials
Institute of Agrophysics, Polish Academy of Sciences
Good day, Valentina Cantaro! Hope you are doing well.
1. 98% H2SO4 treatment for 10 min.
2. 4:1:1 solution of dH2O, 30% H2O2 and 27% NH4OH for 10 min at 60 deg. C.
3. 1:1 to 1:4 solution of H2SO4:H2O2 at 120 deg. C for 10 min.
4. Plasma treatment.
Yours sincerely,
M. Sc. Vadym Chibrikov
Department of Microstructure and Mechanics of Biomaterials
Institute of Agrophysics, Polish Academy of Sciences
We had an experience with dissolving silver films in a 1:1 mixture of H2O2 and NH4OH made from just ordinary pharmacy solutions. It worked.
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