I am working with Alumina & Zirconia thin films by reactive dc magnetron sputtering on silicon & soda lime glass substrates. Is it possible to use the Kubelka-Munk method from diffuse reflection spectra to calculate band gap? I know that photoelectron spectroscopy can do this job, but we don't have that facility. So please show some light in optical measurements technique regarding this.
Note: thickness= 100nm.