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Questions related from Muhammed Ali A.V
I am working with Alumina & Zirconia thin films by reactive dc magnetron sputtering on silicon & soda lime glass substrates. Is it possible to use the Kubelka-Munk method from diffuse...
01 January 2015 3,466 11 View
I have fabricated TFTs on SiO2(300nm)/Si(n++) substrate using ZnO as an active layer of thickness 10nm-30nm. For all TFTs, it shows ambipolar behavior!!!. Can anyone tell me is it the problem...
01 January 2015 4,723 11 View
Whether 1sccm=1.69x10-2Pa is it standard value? or it’s differ for chamber dimension and gas. In my case this equation not hold good. Usually I find partial pressure by the difference of final...
02 February 2014 1,468 12 View
Even after repeated scrubbing using sandpaper (high roughness), oxide layer still remains on the target (showing discontinuity on the surface of zirconium target). Is there any solution to...
01 January 2014 2,246 2 View
For example, increasing the thickness of the film causes a decrease in grain size, as a result of the increase in energy band gap. So how does the grain size depends on energy band gap?
04 April 2012 3,016 12 View
i am doing indium oxide thin film by resistive heat method. now looking for a anti-reflection coating in VU region only.can anybody tell me, how i can get transmittance only in the visible region...
11 November 2011 1,104 4 View