I have a stoichiometric Nb3Sn sputtering target but I am having difficulties on controlling the thickness as I don't have density and z factor of Nb3Sn, therefore I couldn't adjust the deposition rate. I searched available online resources but didn't get any information. Asking help regarding this.
Hi Nizam,
The molecular weight of your material is 397.43 g/mol. Try to calculate density from the molecular weight. For the unknown material, you may use Z-factor 1.0. See the attached pdf where the Z-factors and density of many materials are given. You may get some idea from there.
https://www.ltschem.com/msds/Nb3Sn.pdf
Thanks Asish. Do you have any reference about using Z-factor 1 for unknown material?
Greetings,
I think, there could be several ways:
1. Using the sample with known geometry for a test and assuming the homogeneity of deposition you may calculate the thickness from the mass gain per area
2. Putting the mask during deposition process, you may measure the thickness directly using the stylus profiler (e.g. Dektak) by scanning the step between the mask and the deposited layer.
3. In case if expected thickness is less than ~ 5 microns, you may use the focused ion beam (FIB) to see the thickness directly
4. In case the expected thickness is yet larger, you may consider using metallographic cut and look onto the side surfaces with microscope(s)
I hope, this is information is helpful.
Best regards,
AL.
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