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I am trying to deposit Nb3Sn from a stoichiometric target using DC magnetron sputtering technique. The target diameter is 2 inch. I was applying 50 W DC power for 2 hours but the power increased...
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I have a stoichiometric Nb3Sn sputtering target but I am having difficulties on controlling the thickness as I don't have density and z factor of Nb3Sn, therefore I couldn't adjust the deposition...
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