I'm using Sentaurus TCAD from Synopsys company. I am trying to make some structure for my research in our lab. In our structure, we have to depose Aluminum on the top of the substrate and bottom of the substrate.

After making a square silicon substrate, a cathode and an anode are placed at the top and bottom of the substrate, respectively. To this end, in the process of depositing aluminum, the deposition of the cathode is doing well, but deposition is not performed under the substrate. Deposition itself takes place, but it is not located under the substrate.

How should we solve this problem?

Please give me some advice how to depose Aluminum on the bottom of the substrate. (in sentaursus tcad sprocess code!)

I asked to Chat gpt and I tried to using answer of the GPT (using parameter top and bottom or using transform rotate=z angle=90 and so on.)

But they doesn't solve my problem. So I ask for some advice here. In our lab, this is the first time to use TCAD and design some structure. So there are no person to help me.

I am asking how to depose aluminum on the bottom of the structure in the Synopsys Sentaurus TCAD SProcess code.

Thank you for reading.

Best Regards