I functionalized my silicon substrate with the silane by immersion, but would like to remove it as it seems to have grown non-uniformly and in bulk. What are suggestions for how to do this?
The most mild way to break the chemical bonding is to immerse in 1M NH4OH (ammonia solution) for about 48 hours at room temperature. The silane way stay physically bonded and brief sanitation in alcohol water should physically remove.
For background see: https://www.gelest.com/themencode-pdf-viewer/?file=https://www.gelest.com/wp-content/uploads/Hydrophobicity-Hydrophilicity_and_Silane_Surface_Modification.pdf