Is there a way to etch al2o3 by wet etching, I mean the device source/drain contacts have gold on top, and over it is the al2o3 that needs to be removed for S/D contacts.
My concern is that the wet etchant should not affect the S/D contact material.
Is there a way out or anything which anybody can clear for me?
Dear Aasif, thanks for posting this interesting technical question on RG. We never carried out this process in our lab ourselves. However, I can suggest to you the following potentially useful Master thesis which might help you in your analysis:
Aluminum oxide hard mask fabrication by focused ion beam implantation and wet etching
(please see attached pdf file)
You might also want to have a look at the answers given to some closely related questions which have been asked earlier on RG:
How to wet etch Al2O3 mask?
https://www.researchgate.net/post/How_to_wet_etch_Al2O3_mask
(6 answers)
and
How to etch alumina (Al2O3) to reveal microstructure characterizations?
https://www.researchgate.net/post/How_to_etch_alumina_Al2O3_to_reveal_microstructure_characterizations
(also 6 answers)
I hope this helps. Good luck with your research!
Thank you prof Frank T. Edelmann, so nice of you to put a detailed answer to my query, though some doubt still remains as regards my concern.
Thank you prof Aiman Eid Al-Rawajfeh .
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