In some cases of MoS2 thin film fabrication, the methods usually used are CVD, spin coating and dip coating. In the three methods mentioned, usually the deposited film is heated at high temperatures above 800C. Because the substrate used is Silicon, it will be fine.

What if the substrate we use is not silicon, for example BK7 glass? Some papers transfer MoS2 from a silicon substrate to the desired substrate, but I'm not sure the MoS2 layer will bond tightly with the substrate I use.

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