Does anyone have experience with it? I would like to know what is meant by molten KOH? Is it different from KOH solution? In particular, I would like to determine the etch pit density of my as-grown GaAs layer on Si using this method. How to carry out such experiment? Any suggestions regarding this are greatly appreciated.
the molten KOH is the melt of pure KOH. To get it, you need put pure KOH in a quartz cup or a Al2O3 cup and then heat it to its melt point about 300 C [Journal of Solid State Chemistry 192(2012)60–67]. A KOH solution is the solution KOH + H2O. To carry out etch pit density measurement, you should firstly etch the crystal for a duraition and then observe the etch surface under a OM. Then you can chose a proper magnifition times to ensure there are a large number of etch pits in the view field. Taking several photos of them at different locations and then do a statistical analysis of the pit density. In the process you can use a sortware Image pro plus . Good luck!
Thank you very much, Lunyong.
Is pure KOH solid?
Few days ago, I performed this measurement using KOH solution (45%) and my sample is ruined.
what temperature have you used? also the etching time should be considered. you can short the time and decrease the temperature properly. I do not know if KOH is a suitable etchant for GaAs. if you have seen molten KOH in literatures, it think you need to look for the suitable temperature and duration.
325C for 12 minutes.
No, KOH is not an etchant for GaAs.
Do you think I could use KOH aqueous solution for this purpose? But then my question is why molten KOH is mentioned in the literature?
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