I have a gold layer (150nm) on Si wafer (template stripped). I have a layer of thiols deposited on this gold layer. AFM and XPS studies tell me that the height of this monolayer is around 2-3 nm. I am now facing problems with the ellipsometry measurement. How can I go about performing the measurement? Which values must be plugged in before I can calculate the thickness of the thin film ?
I used an incident angle of 70 degrees.
I have no prior expertise of ellipsometry.
Thanks and kind regards
Good work Shawna!! Keep in touch.
Hi Ankita, I am wonder to know the usage of ellipsometry in your work. Definitely, it's a tool to measure thickness of deposited thin films but you have already characterized with well-standard AFM technique. Have you pre-calibrated the AFM instrument? What is the surface roughness of deposited Au electrodes? Did you use PVD (e-beam/thermal/sputter) technique for Au deposition? Or Lift-off process? Please see following papers: Article Paper-Based Analytical Biosensor Chip Designed from Graphene...
Article Detection of Prostate Specific Antigen (PSA) in Human Saliva...
I have used DTSP to develop a SAM layer on Au electrodes. You can use these papers as reference. Also, let me know if I could be of any help in your work. Thanks!
Use the Brewster angle of film as an incident angle and take minimum five measurements from different positions of the film and take its average.if your films Brewster angle is 60 take angles 55,60,65 using variable angle ellipsometer.
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