Dear Mohammad Ahmad,

Have you measured your film thickness using a surface profiler instrument? You can't supposed to have the thin films as you expected if the calibration has been done recently.

Secondly, any cross contamination could have if your sputtering machine not cleaned before your deposition.

If you check these too factors, you should have correct results.

Hope it helps.

Dr Xuhua Wang

I haven't measured the thickness. But the sputtering machine used to deposit the AZO thin films had a quartz microbalance to give the film thickness and the reading on the microbalance was shown to be 0.241 Kiloangstroms which is around 24 nanometers when converted.

I have EDS Results of the film and there does not seem to be any cross contamination. Only Zinc, Oxygen. and Aluminum.

@Mohammad Ahmad,

It does make sense though. Your films are not only Zinc and Oxygen elements. There is Aluminium element too. Therefore you can't compare the resistivity of your films with the resistivity of ZnOx. Aluminium doped into ZnO can lead to low resistivity. You could find many references related to Aluminium doped into ZnO.

@Xuhua Wang. I get what you men. But the thing is I want low resistivity, but I am getting high resistivity instead.

My thin films give me resistivity in the Kilohm range. Whilst I want and the literature suggests their resistivity in the miliohm range. Even with aluminum doping the resistivity doesn't is higher than ZnO thin films