I have a thin layer of Al (20 nm) on a ITO. I was wondering if MF-319 or MFCD-26 can be used to etch Al without etching away the ITO.
Thank you
I have a thin film of perforated Al (40nm-80nm). I have read that ideally Al should be annealed at 1/3rd the melting point of bulk Al. However, would an oven suffice or does it need an inert...
05 June 2017 7,441 5 View
A crude extract of fungal culture using EtOH was subjected to column and TLC and partially purified compound was obtained. UV vis spectrum of the compound/s has max absorbance at 218nm. The...
11 August 2024 9,801 2 View
How can I measure the thickness of thin film by Uv-Vis?
06 August 2024 7,810 3 View
Why is TLC not a form of partition chromatography and paper chromatography not a form of absorption chromatography?
03 August 2024 7,035 3 View
I need something like Camag's VisionCat software for photodocumentation of TLCs. Could you recommend something?
31 July 2024 8,415 1 View
Hello, I'm trying to measure the conductivity of semiconductor films but since I don't have a commercial four point probe set up I would like to build one on my own in my lab. I have generators,...
30 July 2024 906 2 View
My final research is about making chitosan/pva hydrogel for wound healing using gelatin as crosslinker. Last month, i made the thin film hydrogel and it turn well. It was okay. Last week, i make...
28 July 2024 2,794 6 View
I know that films and other low-thickness laminated products are produced using biaxial orientation, but is there something similar for sheets with a thickness of around 6 mm? Or are they...
21 July 2024 1,559 1 View
I work with planar interdigitated electrodes (IDEs). The finger width and the spacing between the fingers are 5 micron. The surface of the IDEs is coated by a non-conductive polymer layer...
16 July 2024 5,031 1 View
Deep etching Negative photoresist Acrylate polymer Chemical etching Ferric chloride Crosslinking Resolution
11 July 2024 2,476 4 View
Hello, I am an Etch Engineer. I am performing etching with high T_ox/Nit selectivity using remote plasma. Etching plasma is formed using only NH3/NF3/H2. 1. I wonder if it would be advantageous...
11 July 2024 8,115 2 View