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Questions related from Yash Shah
I have a thin layer of Al (20 nm) on a ITO. I was wondering if MF-319 or MFCD-26 can be used to etch Al without etching away the ITO. Thank you
01 January 2019 4,058 0 View
I have a thin film of perforated Al (40nm-80nm). I have read that ideally Al should be annealed at 1/3rd the melting point of bulk Al. However, would an oven suffice or does it need an inert...
06 June 2017 7,404 5 View