Dear community,

I am currently looking into surface structuring technologies, either directly (like DLW, DLIP, LIPSS, plasma etching, electron beam lithography, focused ion beam, ...) or moderated via a resin (nanoimprinting, photolithography, self-assembly, atomic layer deposition, CVD, PVD, sol-gel coatings, ...) and I wonder whether you can answer me the following questions:

Given that I would like to structure a steel sample with a periodic microstructure of 1 μm, a depth of 1 μm, and a feature size of 500 nm - how long would these different technologies approx. need to pattern 1 m²?

Thanks for your answers! Cheers