Could any one comment on the choice of substrate for thin film deposition using sputtering technique? is it necessary to choose the substrate with same lattice constant as that of material or any substrate irrespective of lattice constant can be used in this technique?
Thank you
To my knowledge, it is advisable to choose substrates having lattice matching less than ten percent as to reduce strain during sputtering.
In order to achieve epitaxial growth, which is normally possible at high substrate temperature, you need a substrate which is closely matched :lattice matching.
However if you are not interested in oriented gtow, or the growth of single crystals films, you can choose any other substrate (glass, ceramic, polymer film, metal sheet, or metal foil). In this case you will achieve polycrystalline growth, or sometimes even amorphous films if the deposition conditions are not set appropriately.
K. Sreenivas
It is depend on material deposited. Superconductor can be deposited on MgO and SrTiO3 substrates. Al can be deposited on glass, polyethylene, etc. Sometimes the film exhibits highly c-axis preferred orientation. Substrate temperature could influence the growth of the films.
The answer depends on what you would like to get at the end. Ifa good epitaxial film is required, you need a substrate with goot lattice matching, right orientation and epipolishing of the surface, plus substrate material should be stable at the deposition temperatutes.
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