Through sputtering not possible.
It could be make by thermal evaporation method.
First we have to prepare CH3NH3I through solution process and PbCl2 is commercially available. Then with these two precursors we can go for thermal evaporation.,
As Chandrasekhar wrote, I would not try sputtering as the reactive species most likely damage your film and reduce its quality.
Ontop of the suggested route for thermal evaporation with dual source, you can also deposite through thermal abalation
Good luck.
http://pubs.acs.org/doi/abs/10.1021/cm9811139
We would need a target for sputtering. Instead we can use solution processed method to deposit. Mix the CH3NH3I and PbCl2 powders dry. Crush it in a mortar to get a fine powder. Mix well. The white powder will turn slightly grayish. Now it will dissolve in DMF. Further it can be deposited on glass substrate by spin coating.
Please take a look at our work on the deposition of thin films of perovskite assisted by rf-sputtering.
https://www.nature.com/articles/s41598-018-19746-8
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