You have to be careful with this because you need to be sure your adsorbate grows in a layer by layer fashion rather than by nucleation and cluster/island growth. If you are sure that you have layer by layer growth then there are a number of excellent techniques for determining the layer thickness in terms of monolayers or depth by XPS leaders such as Seah and Powell.
see for example:
M. P. Seah, Surface and Interface Analysis 44 (4), 497 (2012).
A. Jablonski and C. J. Powell, Journal of Vacuum Science andTechnology A 27 (2), 253 (2009).
The papers deal with the attenuation of signal as the overlayer grows for different adsorbate/overlayer materials so assuming you do have layer by layer growth should help you to solve your overlayer thickness
The papers cited by Andrew are really good ones showing the underlying theory and applications. However, I would recommend a simplified model by John Wolstenholme from Thermo using angle resolved XPS to measure the fractional coverage. Have a look at it.
There are many surface science techniques which will help in characterizing growth of adsorbates on different substrates XPS (ESCA) is one of them. Also, for example, AES (Auger Electron Spectroscopy) and work function measurement as a function of deposition time, etc., may be used. The papers cited by Andrew G. Thomas are very good and relevant. For AES and work function measurements you can see some of my work on Li, Cs and O deposited on CdTe substrates. Enjoy your work with XPS and other techniques in this field!
Hallo Monu is the coverage needed as submonolayer, monolayer, or is it an average whose meaning, interpretation depends on the growth mode (as indicated by Amdrew) and which in turn depends on the growth conditions (A good reference here "Introduction to Surface and Thin Film Processes, John A. Venable, Cambridge University Press (2000)". The information obtained depends on the escape depths and geometry so having different energies e.g. Augers, photoelectron peaks can help in the interpretation.