I use ma-N 2400 resists in my processes to create EBL structures on thick insulating layers (SiO2). Starting from some thickness of SiO2 (about 1 um) I faced the charge issues which completely ruin my EBL step.
I have some Electra 92 from Allresist both for positive and Novolac-based resists, but none of them give me even coating. It seems they both give some dissolution of the resist surface, making it rough and wavy.
Brief search gave me no idea about it. The only knowledge I have is that my colleague in another organization successfully use Electra 92 with AR-N 7500 resist, but I have no suitable resist thickness and have no thinner for it (I need AR-N 7500.08 but have 7500.18).
I am not actually familiar with all the metallizing approaches to make charge dissipation layer, so at first I want to understand whether it is possible to use my Electra 92 with ma-N 2400 resist in some circumstances or it is completely impossible?
I also appreciate all advises on using metallic coatings (Al, Ti). Thank you!
There are two versions of Electra 92. For Novalak based resist, you should be using AR-PC 5091.02 according to this site:
http://www.allresist.com/portfolio-item/protective-coating-ar-pc-5090-02-electra-92/
Robb Engle - I've tried to use exactly that version of Electra 92, but it gave that wavy surface. Then it was impossible to wash out the coating in water.
For the information: ma-N2400 resists use cyclopentanon and anisole as solvents in contrary to AR-N7500 resists with PMGEA as solvent. Unfortunately I can't say does it matter or not.
Rinat Galiev Is your first coating completely dry? Did you spin at 4000? Has your sample of Electra been left open and evaporated some solvent, concentrating it?
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