I want to grow thin films (e.g. TiO2) on flexible materials. Which substrates could be used? It should support high temperatures. I guess that the adhesion of the sputtered target is an issue, right?
Manuel is right, the choise of the flexible substrate depend of the condition of the deposition, temperature, pressure and time. Also of the application of the thin films deposited.
Manuel is right, the choise of the flexible substrate depend of the condition of the deposition, temperature, pressure and time. Also of the application of the thin films deposited.
Here is a first hand experience that you may encounter: The deposition is substrate independent for the film growth however, you may experience the deposited film to be broken during handling of the flexible film. Once I deposited 100nm thick Pt layer on 6 inch PDMS wafer (1mm thick). The deposition was okay but when I lifted the PDMS wafer, the film cracked which is visible with naked eye. Probably due to flexibility?
On the issue of deposited film adhesion
You can first deposit ~5nm Ti film before depositing your chosen material. Ti enhanced the adhesion and it adheres to all materials nicely. Though I am not sure how the presence of Ti would interfere in your system/application.
Hi Jorge, Yes I agree with you. I think I was not clear. What I meant is that the deposition rate (or the film thickness) will be substrate independent (As far as I understand, pls correct me if wrong). I was not talking about the properties which of course very much depend upon the surface on which the film is growing as you have also mentioned.
Yes you may fabricate on a flexible sheet. I have once tried using cheap overhead projector polymer using Ti target. The adhesion was nice until i try to bend it over; small crack occur.
My suggestion; you may try to bend the polymer before deposition.
We have grown Ag, NiFe and Co thin films (t < 20nm) on PDMS by sputtering [see APL 103, 072404 (2013)]. In the references there in we cited other groups that have tried Au and [Co/Cu] multilayers also on PDMS, in one hand, and Co on flexible polyester substrates by dc magnetron sputtering, in the other hand.
I have deposited ZnO and ITO on Kapton sheets at around 250 C.
In general adhesion to flexible substrates is an issue, however appropriate substrate cleaning and pre-deposition treatment could be employed to minimize these issues.
As the deposited film (sputtered film + flexible substrate) cools down from deposition temperature to ambient conditions, the thermal expansion mismatch between film and substrate might lead to some amount of bending, and also slight amount of cracking. However this problem can also be resolved with right deposition parameters.
I have been using Upilex® for my photovoltaic devices. It is processable up to 400 C. To obtain better adhesion, you can use atmospheric corona plasma treatment. I am able yo fabricate very high-quality thin films on these substrates by magnetron sputtering technique. If you like to see more detail, you can investigate the following articles.
All the best.
Conference Paper Effects of Dual RF Plasma Treatment on Polyimide Films Used ...
Conference Paper Effects of microwave and RF plasma treatment on the surface ...
Poster Atmospheric Air Plasma Modification and Thin Film Deposition...
Poster Plasma Surface Modification of Polyimide Films as Flexible S...