I am thinking of implementing an Atomic Force Microscope for nanoindentation-assisted nanolithography experiments and I don´t know if photoresist films are generally adhesive to glass substrates. I had worked with silicon substrates, but never with glass ones.
I hope that someone can share relevant expertise about this issue.
Yes, almost all photoresist work very well on glass. Actually the use on oxide silicon is very common and SiO2 is glass.
Ya its right if you are finding good adhering of film on si with oxide at top....glass behaves in same manner...only thing you need to see the strain should not be in film...otherwise as temp changes it will come out like flakes...and here you need about 10time thicker film than the indentation depth hence you need to check the conditions. Best of luck.
Yes, photoresists can adhere to well-cleaned glass substrates. Adhesion can be enhanced by including a UV-ozone treatment of the substrate prior to coating photoresist.
I think this link will be helpful for you
https://www.allresist.com/resist-wiki-what-are-the-adhesion-features-of-photoresists-on-different-wafers/
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