Some Ge nano structures were fabricated top down on SiO2 layer (main sample is GOI). The a-Si layer is evaporated to this structures prior to implantation. Now a-Si needs to be removed.
did you try the wet etching? But sometimes it's hard to control the etching rate. And dry etching (with plasma) also can do.
My exact question was about the wet etching recipe. Do you have any recommendation?
maybe HF solution. (Hydrofluoric acid)
But for the exact recipe, I forgot this. Sorry.
This was my previous experience, several years ago.
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