ALD dep SIN thin film without seam?

26 June 2025 1 8K Report

HI all, I have tech question need help How to reduce the use of ALD to generate SIN and fill the gaps between array structures in a 5:1 aspect ratio array columnar structure (with the bottom layer being a ploy and the top layer being an ox), ensuring that there are no seams inside the grown SIN film?...

A. Bouhdjer

Before SiN ALD, deposit a sacrificial or flowable oxide (SOG/HSQ) to partially fill the gaps, then etch back to open the top of the trenches.
Use high-reactivity precursors (e.g., BTBAS + NH₃ or low-temp chlorosilanes) that promote conformal growth even with shorter ALD cycles.

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