For electrodeposition of metals on a small SS disk at trace level I used XPS to know whether the the deposition was in metallic form or it was in compound form. In XRF, I did not get such information. Will you please explain me the reason behind it?
The chemical shift is from 0.1 to 1 eV, and the energy resolution of XPS can detect such small energy shift. However the XRF spectrometer's energy resolution is 10 eV to 200 eV, which means the small chemical shift is not observable. I have once used 0.1 eV energy resolution XRF spectrometer and can measure the chemical shift by that XRF spectrometer, but the intensity of such high resolution XRF spectrometer is quite low.
Thank you Dr Jun Kawai. Now I understand that for low range of energy resolution small chemical shift in case of sample at a few microgram level can be detected by XPS which iss not possible in XRF. While I examined the metallic nature of my electrodeposited sample.
It should be added that if you use some characteristic lines, e.g. L alpha observed by wavelength dispersive EPMA (electron probe microanalyzer), then you can know the oxidation state from the profile change of X-ray emission line (This case it is not called as XRF, because excitation is by electron beam). Please check my book, "X-Ray Spectroscopy for Chemical State Analysis" from Springer https://www.researchgate.net/publication/367282941
Thank you very much for your nice explanation and the reference of your book mentioned. I shall try to refer your book once I get it.
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