Hello Arabinda,

PLD is so popular for ferroelectric thin film growth because the advantages of this techinque for the growing of multi-component in both the final stoichiometry and the low substrate temperature needed to obtain cristallinity. More information you can see in these paper:

1. “Deposition of Polycrystalline of BaFe12O19 Thin Films by using a Nd-YAG laser system” , García T., Sánchez J. L., Díaz S., Ponce L., Estévez E., Peña J. L., Bartolo P., Farías M., Material Letters, V28, N1-3, p.65-9, 1996.

2. “Textured Strontium Ferrite Thin Film Grown by PLD”, T. García, E. de Posada, L. Ponce, J. L. Sanchez, S. Diaz, E,. Pedrero, F. Fernández, P. Bartolo-Perez, J. L. Peña, R. Diamant, J. A. Pereira, Materials Letters, N49, 2001, 294-298.

best regards

Luis

Hi Arabinda,

PLD has lot of advantages compared to other deposition methods

With PLD complex stoichiometries, soft metal-organic hybrids, biological materials can be also deposited.

By using the PLD deposition method thin film properties can be controlled in terms of crystalline structure (polycrystals, monocrystals, amorphous, etc), thickness, stoichiometry and composition (e.g. starting from a metal, a succesion of several layers with different composition can be grown: metallic, oxidic, nitridic or mixtures of such compounds) thus multilayered or even concentration gradient structures may be obtained (Combinatorial method).

Regards

Kesava

PLD helps us to obtain a uniform and high quality stoichiometric thin film.

Most importantly because, You can easily ablate a large set of materials. What you need is a pellet.

and also, it's relatively easy to maintain multi cation stoichiometry for oxide materials thin-film deposited by PLD.

Something less well-known- If laser power tuned properly, you can even evaporate a material... If you start lowering your laser power, at one point u will stop ablating and start evaporating.