Generally grain size increases with increased film thickness but it is decreasing in my case. What could be the probable reason for this?
dear Sharma
i worked on ZnO on SI and Psi by using APCVD
what is method to deposition thin film low temperature or high temperature?
What is the deposition method and conditions used? How did you measure the grain size?
Dear Sharma, in order to answer your question, you must specify at least: 1. deposition method; 2. deposition conditions; 3. how do you achieve different coatings thickness.
Method: RF sputtering , Deposition Condition: 100 watt (RF Power), 15sccm argon gas flow rate at room temperature. This phenomenon i have observed only for thin films. As thickness has increased to a certain level grain size has started to increase with thickness.
I think that you should check the grain size by SEM as well to confirm the already observed behavior
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