I have attached the structure of the MOS device. Currently I would like to coat a graphene Qds, fullerene QDs above Si wafer.
Spin coating can be used. Depending on rpm, concentration of QDs you can control the dispersion. Our recent paper will be useful for you.
http://link.springer.com/article/10.1007%2Fs00339-014-8981-3
Spin coating or spray can be used. the problem is choice of the solvent and the deposit parameters .
you can try electrodeposition as well.
Thank you sir @S.D.Sartale, Z Ben and Md. Kashif
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