Besides purity, is there any advantage of sputtering technology over thermal evaporation for making metallised films? Which one is better if less adhesion is required on same substrate ?
Is there any difference in the final appearance of the film made using these two technologies - texture or gloss wise
Thanks Mr. Andrei. I was of the understanding that sputtering gives us bigger particle size so the test ure is less glossy then the film made using thermal evaporation. Is that right?
The film quality in sputtering is better than thermal evaporation or e-beam evaporation. But in some cases sputtering can not be used because it can damage the substrate or devices.
Thickness, surface morphology, and work function etc are easily controllable using sputtering process. Moreover, sputtering is also effective for oxides and higher boiling point materials.
Thanks Mr. Firoz & Mr. Barman.
Mr. Tapan, can you pls help me understand the surface morphological differences by Sputtering & Thermal evaporation ? Is there any correlation between surface morphology and final appearance of the film in terms of glossiness ? As per my experience I find films produced by thermal evaporation much more glossy/shiny then one produced using sputtering. Your answer will help me either validate or correct my observation.
Hi Ms. Meena,
It's difficult to say anything about the smoothness or roughness looking at the film. You have to check by using SEM or AFM. But if you want some microstructure or nanostructure at the film then it's difficult by using thermal evaporation technique. By using sputtering process you can easily tailor the surface morphology. If you want a very smooth thin film that is also possible by using the sputtering technique. However, there is a difficulty that the sputtered atoms or molecules or group of atoms sometimes avail high kinetic energy depending upon the reactor pressure and sputtering power, therefore, can easily penetrate.
- Badges
- Science topic
- Similar topics
- Engineering
- Materials Engineering
- Coating