I would like to deposit a single Pt nano-column with GIS and FIB of a diameter 500 nm. Is it possible? What values of parameters of ion beam (accelerating voltage, current) and scanning (mode, dose, dose factor, pixel spacing, numer of cycles) should be used?
I achieved 200 nm column with parameters as shown in the attachment. I have been trying to fine-tune the parameters but I could not decrease the diameter.
I tried both single point and small square (nominal dimensions 100 nm x 100 nm) as a layout.
Hi Piotr, maybe not an answer you hoped for, but the easiest way is to use thin substrate, e.g. SiN membrane. This will result in significant reduction of area where the "parasitic" growth takes place due to e.g. scattered ions and secondary electrons.
On bulk substrate, you have to use the highest energy (30 keV I guess) because the beam spot and, more importantly, surface part of the interaction volume are the smallest. Point exposure, vary current.
Miroslav Kolibal thank you for your insight. Concerning the thin membrane approach - do you mean to deposit the Pt in a single pore of such membrane and then dissolve the membrane? This seems to me to be an idea worth trying. Or maybe there is another solution I cannot anticipate?
Hi Piotr Jenczyk I guess for these experiments you use some bulk substrate (e.g. piece of silicon). Instead, use membrane (e.g. TEM membrane on a grid) as substrate for deposition. This will significantly reduce the parasitic radial growth, which is contributing the diameter of your nanowires. So that in the end you will have a small diameter nanowire standing on a mebrane instead of bulk sample. Then, it depends on the purpose you intend to use this nanowire for. This trick is clearly possible only if bulk substrate is not necessary for your demanded application.
Miroslav Kolibal Now I understand. Thank you so much for your insights. I will surely try that.
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