I am dealing with CaPO4 powder sintered at 1000C and eatimated particles length is about 0.5 - 1 micron via SEM.
Poonam Kharangarh Alexander Katz-Demyanetz
There are 2 other causes of line broadening in the XRD pattern:
- Instrumental broadening. This is assessed by use of a highly crystalline material with sharp peaks. My earlier answer indicates one material (that I used) for this
- Strain broadening
The Scherrer formula deals with neither of the above. Use of the Williamson-Hall method will allow the strain portion to be separated out.
The best way is to measure an instrumental broadening on a standard annealed stressless sample and then just take in into account in the Sherrer formula.
Use the peak broadening present in the XRD pattern of standard powder sample of Silicon to eliminate it from any measured XRD pattern.
Ismat Ullah Many years ago I used a quartz sample of about 15 microns. You need to select a material whose peaks do not interfere significantly with yours. Williamson-Hall is preferred to Scherrer as there is also strain broadening to take account of.
Poonam Kharangarh Alexander Katz-Demyanetz
There are 2 other causes of line broadening in the XRD pattern:
- Instrumental broadening. This is assessed by use of a highly crystalline material with sharp peaks. My earlier answer indicates one material (that I used) for this
- Strain broadening
The Scherrer formula deals with neither of the above. Use of the Williamson-Hall method will allow the strain portion to be separated out.
Sure Sir and Thank-you very much for your valuable information....
BTW, use of a standard does not remove instrumental broadening. It simply allows the effect to be quantified.
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