Most developers are water-based and at least slightly basic. I'm trying to do photolithography on ZnO nanosheets. My ZnO nanosheets are very thin and they are etched off by the developers. The one I used was AZ 327 MIF.
Khalil Eslami Jahromi
I used shipley 1813 (S1813) as a photoresist and TMAH as a developer, but developing is very sensitive and challenging.
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Sumit Choudhary
Dilute the TMAH SOLUTION by Di water in different ration then chech which ratio best suits for your case.
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